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Theses/Dissertations
Author Kanikella, Phaninder Reddy, 1983-

Title Process development and applications of a dry film photoresist / by Phaninder Reddy Kanikella.

Published ©2007.
LOCATION CALL # STATUS
 MST Thesis  THESIS T 9243    NOT CHECKED OUT
Description x, 66 leaves : illustrations ; 28 cm.
Summary "In this study, dry film photoresist was patterned using UV lithography and the sidewall profile was optimized to achieve vertical sidewalls. Sidewall verticality of dry film is very important for better pattern transfer"--Abstract, leaf iv.
Notes Vita.
Includes bibliographical references.
M.S. University of Missouri--Rolla 2007.
Subjects Semiconductors -- Etching.
Microelectromechanical systems.
Other Titles MST thesis. Materials Science and Engineering (M.S., 2007).
Process development and application of dry film photoresist in MEMS.
Process development for reactive-ion etching of dry film photoresist.
Additional Keywords Reactive ion etching.
OCLC/WorldCat Number 233638949
Permanent Link
http://merlin.lib.umsystem.edu:80/record=b6400406~S5